CVD Silicon Anode Production Line

Vapor deposition silicon carbon anode material is an anode material formed by uniformly loading silicon (Si) in the form of nanoscale particles, thin films, or nanowires onto the surface or interior of a carbon substrate (such as graphite, carbon nanotubes) through chemical vapor deposition (CVD) or physical vapor deposition (PVD) techniques, and coating it with a carbon layer to form a stable "silicon carbon" composite structure. Its core advantage is the more uniform nanoscale dispersion of silicon and stronger bonding at the silicon-carbon interface, which can maximize the high capacity of silicon (theoretical 4200 mAh/g) and suppress volume expansion (through carbon matrix buffering). It is an important technical route for mass production of high-energy density silicon carbon anodes. The production line is designed around "vapor phase silicon deposition, carbon coating/composite, and structure control".